首页 | 本学科首页   官方微博 | 高级检索  
     

Subthreshold current model of fully depleted dual material gate SOI MOSFET
引用本文:苏军 李尊朝 张莉丽. Subthreshold current model of fully depleted dual material gate SOI MOSFET[J]. 西安交通大学学报(英文版), 2007, 19(2): 135-137,171
作者姓名:苏军 李尊朝 张莉丽
作者单位:[1]School of Computer Science, Xi'an Polytechnic University, Xi'an 710048, China [2]School of Electronics and Information Engineering, Xi'an Jiaotong University, Xi'an 710049, China
摘    要:

关 键 词:场效应器件 亚阈值电流模型 SOI MOSFET 不对称光环
文章编号:1671-8267(2007)02-0135-03

Subthreshold current model of fully depleted dual material gate SOI MOSFET
Su Jun,Li Zunchao,Zhang Lili. Subthreshold current model of fully depleted dual material gate SOI MOSFET[J]. Academic Journal of Xi’an Jiaotong University, 2007, 19(2): 135-137,171
Authors:Su Jun  Li Zunchao  Zhang Lili
Abstract:Dual material gate SOI MOSFET with asymmetrical halo can suppress short channel effect and increase carriers transport efficiency. The analytical model of its subthreshold drain current is derived based on the explicit solution of two-dimensional PoissonCs equation in the depletion region. The model takes into consideration the channel length modulation effect and the contribution of the back channel current component. Its validation is verified by comparision with two dimensional device simulator MEDICI.
Keywords:asymmetrical halo  dual material gate  subthreshold current
本文献已被 维普 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号