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| FABRICATION AND CHARACTERATION OF NANOPOROUS SILICA FILM | |
| 引用本文： | 殷明志,张良莹,姚熹. FABRICATION AND CHARACTERATION OF NANOPOROUS SILICA FILM[J]. 西安交通大学学报(英文版), 2003, 15(2) |
| 作者姓名： | 殷明志 张良莹 姚熹 |
| 作者单位： | Electronic Materials Research Laboratory，Xi'an Jiaotong University，Xi'an 710049，China，Electronic Materials Research Laboratory，Xi'an Jiaotong University，Xi'an 710049，China，Electronic Materials Research Laboratory，Xi'an Jiaotong University，Xi'an 710049，China |
| 基金项目： | ThisworkwassupportedbytheNational973ProjectofChina(No.2002CB613305).ElectronicmaterialinstituteofXianJiaotongUniversity. |
| 摘 要： | Microporoussilicafilmswithspecialpropertiesareexpectedtobeusedinmanyfields,suchasopticalcoat ing[1 ] ,sensor,membrance[2 ] ,anddielectricfilm[3 ] .Itslowsoundspeedandacousticdelayorhigherratiosoundinsulatingmaybeusedasultrasounddetector[4] .Theexcellentfeaturesofinsulatingpropertyanditsnearper fectinterfaceonsiliconcouldplayakeyroleinsuccessofverylargescaleintegrated(VLSI)devices[5〗,etc.Intheotheraspects,nanoporoussilicafilmsarebeingusedinseparationtechnology[6] ,molecularengineering,andbi… |
FABRICATION AND CHARACTERATION OF NANOPOROUS SILICA FILM |
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| Yin Mingzhi,Zhang Liangying,Yao Xi Electronic Materials Research Laboratory,Xi'an Jiaotong University,Xi'an ,China.. FABRICATION AND CHARACTERATION OF NANOPOROUS SILICA FILM[J]. Academic Journal of Xi’an Jiaotong University, 2003, 15(2) | |
| Authors: | Yin Mingzhi Zhang Liangying Yao Xi Electronic Materials Research Laboratory Xi'an Jiaotong University Xi'an China. |
| Affiliation: | Electronic Materials Research Laboratory, Xi'an Jiaotong University,Xi'an 710049, China |
| Abstract: | Colloidal silica sol is formed by a novel hydrolyzing procedure of tetraethyl-orthosilicate(TEOS) catalyzing with NH3*H2O in aqueous mediums. Glycerol, combining with the hydrolyzed intermediates of TEOS, controls growing of the silica particles; poly(vinyl-vinyl alcohol makes the colloidal silica sol with polymeric structure and spinning, thermal strain makes the gel silica film changed into a nanoporous structure with diameter ranging 50-150 nm. Morphologies of the nanoporous silica film have been characterized; the porosities (%) is 32-64; the average dielectric constant at 1MHz region is 2.0 and 2.1; the thermal conductivity is less than 0.8. Chemical mechanism of the sol-gel process is discussed. |
| Keywords: | tetraethylorthosilicate sol gel technique nanoporous silica film thermal conductivity |
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