首页 | 本学科首页   官方微博 | 高级检索  
     检索      

多次纺丝与退火对 ITO 薄膜表面均匀性的影响
引用本文:常溪,杨立宁,齐海波.多次纺丝与退火对 ITO 薄膜表面均匀性的影响[J].石家庄铁道学院学报,2014(2):100-104.
作者姓名:常溪  杨立宁  齐海波
作者单位:石家庄铁道大学材料科学与工程学院,河北石家庄050043
摘    要:通过多次纺丝与退火工艺在普通玻璃载玻片上制备ITO透明导电薄膜,研究了退火工艺对薄膜表面形貌的影响。结果表明:退火不仅提高了ITO颗粒的洁净程度,同时减小了其在薄膜表面的粒径分布。多次纺丝与退火可以提高ITO颗粒的覆盖密度,得到致密性比较好、表面缺陷比较少、表面粗糙度比较小、均匀平整的透明导电薄膜。

关 键 词:ITO透明导电薄膜  多次电纺丝  退火  表面均匀性

Surface Uniformity of ITO Thin Films Prepared by Repeatedly Electro-spinning and Annealing
Chang Xi,Yang Lining,Qi Haibo.Surface Uniformity of ITO Thin Films Prepared by Repeatedly Electro-spinning and Annealing[J].Journal of Shijiazhuang Railway Institute,2014(2):100-104.
Authors:Chang Xi  Yang Lining  Qi Haibo
Institution:1. Physics and electronic information Department, Cangzhou Normal University, Cangzhou 061001, China ; 2. Institute of electrical and electronic engineering, Shijiazhuang Railway University, Shijiazhuang 050043, China)
Abstract:ITO Transparent conductive thin film on slide glass was prepared by multiple electro-spinning and annealing process .The results indicate that that annealing promotes crystallinity and reduces size distribution of ITO particles.As the result, uniform and smoothing thin film of high loading of ITO particles can be obtained with less surface defects and small roughness .
Keywords:ITO transparent conductive film  multiple electro-spinning  annealing  surface uniformity
本文献已被 维普 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号