| 酞菁铜薄膜制备及其光学性能 |
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| 引用本文： | 刘向,刘惠,薛钰芝,王克非.酞菁铜薄膜制备及其光学性能[J].大连铁道学院学报,2010(6):79-82. |
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| 作者姓名： | 刘向 刘惠 薛钰芝 王克非 |
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| 作者单位： | 大连交通大学材料科学与工程学院;大连理工大学电气信息学院; |
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| 摘 要： | 采用真空蒸发的方法在ITO玻璃上制备了CuPc薄膜,并用分光光度计（U-3310）测试了四种不同厚度的CuPc薄膜的透射/吸收/反射率随波长变化情况,重点分析了其中的吸收规律.结果显示波段在340~370 nm和570~720 nm光吸收率基本上在90%左右,在480 nm吸收率最低,大部分光都已透射.同时用扫描电子显微镜对薄膜进行了成分分析,对照能谱图可以看出样品中含有碳、氧、铜等元素,与酞菁铜薄膜元素组成成分相符.
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| 关 键 词： | 酞菁铜 半导体薄膜 真空蒸发镀膜 |
Optical Character Study and Preparation on CuPc thin Film |
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| LIU Xiang,LIU Hui,XUE Yu-zhi,WANG Ke-fei.Optical Character Study and Preparation on CuPc thin Film[J].Journal of Dalian Railway Institute,2010(6):79-82. |
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| Authors: | LIU Xiang LIU Hui XUE Yu-zhi WANG Ke-fei |
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| Institution: | LIU Xiang1,LIU Hui2,XUE Yu-zhi1,WANG Ke-fei1(1.School of Materials Science , Engineering,Dalian Jiaotong University,Dalian 116028,China,2.School of Electronic , Information Engineering,Dalian University of Technology,Dalian 116024,China) |
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| Abstract: | CuPc thin film is prepared by using vacuum evaporation method on ITO glass substrate,and the transmission/absorption/reflection ratio is measured using U-3310.The analyzsis of the absorption data show the light absorption rate is about 90% with the ware band in the 340～370 nm and 570～720 nm and the lowest absorption rate occurs arround 480 nm.Compositionanalysis of thin films of confirms that the sample contains carbon,oxygen,copper and other elements with the same composition of copper phthalo-cyanine thin film. |
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| Keywords: | CuPc semiconductor thin-film vacuum evaporation deposition |
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