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The study of silicon on insulator(SOI)MOSfield effect transistors(MOSFETs)has been ofgreat interest in recent years[1-2].As the di mensionsof SOI MOSFETs are aggressively scaled into thenanoscale regi me,the inversion carriers shift appar-ently away fromthe interface of Si O2/Si due to thequantumeffect.So it is quite necessary to take thequantumeffect into consideration in SOI MOSFETmodeling and si mulation.The Schr dinger-Poisson(SP)equations subject to an appropriate boundaryc… 相似文献
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Dual material gate SOI MOSFET with asymmetrical halo can suppress short channel effect and increase carriers transport efficiency. The analytical model of its subthreshold drain current is derived based on the explicit solution of two-dimensional PoissonCs equation in the depletion region. The model takes into consideration the channel length modulation effect and the contribution of the back channel current component. Its validation is verified by comparision with two dimensional device simulator MEDICI. 相似文献
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