| 溅射等离子体气相沉积簿膜异常放电的表征和抑制技术 |
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| 引用本文： | 孔令刚,蒋庆安,张巍钟.溅射等离子体气相沉积簿膜异常放电的表征和抑制技术[J].兰州铁道学院学报,2007,26(6):160-161. |
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| 作者姓名： | 孔令刚 蒋庆安 张巍钟 |
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| 作者单位： | [1]Key Laboratory of Opto-Elcctronic Technology and Intelligent Control, Ministry of Education, Lanzhou Jiaotong University, Lanzhou 730070 ,China [2]Modern Information Technology and Education Center, Lanzhou Jiaotong University, Lanzhou 730070,China |
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| 摘 要： | Introduction During the filming process of plasma vapor deposition,arcing takes place in plasma cavity due to target pollution,charge accumulation and Insulating ability reduction.Frequent arcing ablates base material,reduces thin-film
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| 关 键 词： | 等离子体汽相淀积薄膜 反常弧光 表征 抑制 阻抗 |
| 文章编号： | 1001-4373（2007）06-0160-02 |
| 收稿时间： | 2007-09-23 |
| 修稿时间： | 2007年9月23日 |
Representation and Inhibition of Abnormal Arcing in Plasma Vapor Deposition Filming |
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| Kong Linggang,Jiang Qing''''an,Zhang Weizhong.Representation and Inhibition of Abnormal Arcing in Plasma Vapor Deposition Filming[J].Journal of Lanzhou Railway University,2007,26(6):160-161. |
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| Authors: | Kong Linggang Jiang Qing'an Zhang Weizhong |
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| Institution: | Key Laboratory of Opto-Electronic Technology and Intelligent Control, Ministry of Education, Lanzhou Jiaotong University,Lanzhou 730070, China;Modern Information Technology and Education Center, Lanzhou Jiaotong University, Lanzhou 730070,China |
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| Abstract: | Introduction During the filming process of plasma vapor deposition, arcing takes place in plasma cavity due to target pollution,charge accumulation and Insulating ability reduction. Frequent arcing ablates base material, reduces thin-film compactness and Smoothness,and even makes thin-film fall off. |
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