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等离子体刻蚀对Nafion(R)膜性能的影响
引用本文:唐金库,巴俊洲,蒋亚雄,李军. 等离子体刻蚀对Nafion(R)膜性能的影响[J]. 舰船科学技术, 2007, 29(6): 135-138
作者姓名:唐金库  巴俊洲  蒋亚雄  李军
作者单位:中国船舶重工集团公司第七一八研究所,河北,邯郸,056027
摘    要:介绍了不同等离子体刻蚀条件对用于电解水制氢领域的Nafion(R)117膜的性能影响.测试经表面刻蚀处理的Nafion(R)膜的含水率、交换容量和电解性能,寻找最适用于Nafion(R)膜表面刻蚀的条件.适宜的刻蚀有效地扩大了Nafion(R)膜和催化电极之间的反应界面,并且使电极形成多孔结构,有利于产生的气体从电极上释放,降低槽电压.但过度刻蚀将破坏膜的离子簇,导致气阻增加,引起槽体性能下降.因此应严格控制射频功率和处理时间.

关 键 词:等离子体刻蚀  Nafion(R)  膜-电极界面  等离子体  表面刻蚀  Nafion  膜性能  性能影响  plasma etching  Effects  performances  时间  射频功率  控制  槽体  气阻  离子簇  破坏  槽电压  气体  多孔结构  催化电极  反应界面
文章编号:1672-7649(2007)06-0135-04
收稿时间:2006-08-22

Effects of plasma etching on Nafion(R) membrane performances
TANG Jin-ku,BA Jun-zhou,JIANG Ya-xiong,LI Jun. Effects of plasma etching on Nafion(R) membrane performances[J]. Ship Science and Technology, 2007, 29(6): 135-138
Authors:TANG Jin-ku  BA Jun-zhou  JIANG Ya-xiong  LI Jun
Abstract:The article introduces the effects of different plasma etching conditions on Nation^R membranes performances which are used for water electrolysis. The suitable conditions for surface-roughening Nation^R membranes are investigated by testing water content,exchange content and cell performance for water electrolysis of surface-roughed membrane. Suitable etching will enlarge effectively the reaction interface between Nation^R membrane and the electrode and forming a porous structure of the electrode, which facilitated the release of evolving gas from the electrode, and reduce the cell voltage. However, excessive etching will destroy ions cluster of Nation^R membrane, result the increase of gas impedance, and the decrease of cell performances. Therefore the radio power and treatment time of etching machine should be controlled strictly.
Keywords:plasma etching   Nation^R   membrane-electrode interface
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