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集成电路老化温度与耗散功率、频率关系的研究
引用本文:王鲁宁.集成电路老化温度与耗散功率、频率关系的研究[J].舰船电子工程,2009,29(9):172-174.
作者姓名:王鲁宁
作者单位:武汉数字工程研究所,武汉,430074
摘    要:在集成电路的可靠性试验中,耗散功率随着集成电路技术发展而增长,这也是由于温度和集成电路频率作用的关系。因此,在老化环境中,耗散功率会加大对老化的影响。文章将重点讨论在老化环境中,温度和频率的调整对集成电路老化所产生的作用。

关 键 词:集成电路老化  温度  耗散功率  频率

Analysis of the Action of Static Power Dissipation in Burn-in Condition on Yield of VLSI
Wang Luning.Analysis of the Action of Static Power Dissipation in Burn-in Condition on Yield of VLSI[J].Ship Electronic Engineering,2009,29(9):172-174.
Authors:Wang Luning
Institution:Wuhan Digital Engineering Institute;Wuhan 430074
Abstract:In experiments of assessing the reliability of integrated circuits,the leakage power is expected to increase with scaling of molectron technology,the increased leakage is a strong function of the elevated temperature and voltage stress.Under the bum-in(BI) conditions the elevated leakage power may cause increased post burn-in fallout.In this paper the impact elevated leakage and technology scaling in bum-in environment on post BI yield is analyzed.
Keywords:molectron burn-in  temperature  power dissipation  frequency  
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