水平连铸QCr0.5铜合金线电磨损性能研究

对水平连铸工艺制备的QCr0.5铬青铜合金接触导线坯料经过固溶、时效、冷轧处理后,研究接触导线的微观摩擦性能与受流滑动磨损行为,分析不同电流作用下接触导线的磨损形貌及磨损特征。微观划擦测试表明:通过加入合金元素Cr,改变了接触导线合金材料的微观组织,提高了合金材料的强度、抗软化性能和抗变形能力,改善了合金的磨损性能,降低了摩擦系数;水平连铸QCr0.5铬青铜合金接触导线的硬度为165.5HV,最大摩擦系数为0.155,最大压入深度为2.68μm。电磨损测试表明:水平连铸QCr0.5铬青铜合金接触导线未加载电流时的磨损主要以磨粒磨损和黏着磨损为主,载流条件下的磨损主要是黏着磨损、磨粒磨损和电侵蚀磨损。磨损率测试结果显示,水平连铸QCr0.5铬青铜合金接触导线磨损性能明显优于商用Cu-Ag接触导线。     

First-principle investigation of the structural stability and electronic property of precipitates on the Cu-rich side of Cu-Ni-Si alloys

The energetic and electronic structures of precipitates on the Cu-rich side of Cu-Ni-Si alloys were investigated by using the first-principle calculations based on plane-wave pseudopotential method. The negative formation heats and the cohesive energies of these precipitates were estimated with electronic structure calculations, and their structural stability was also analyzed. The results show that δ-Ni₂Si, γ-Ni₅Si₂ and β-Ni₃Si precipitates all have great alloying ability and structural stability, which, after comparing their density of states (DOS), is found attributed to the pseudogap effect near the Fermi level (E _F) and strong hybridization between the Ni-3d and Si-3p states. Compared with the other two precipitates, the δ-Ni₂Si precipitate has the greatest structural stability, which is resulted from its lower DOS at E _F and the main bonding peaks slightly moving to the low energy region.