ICP-PECVD法制备类金刚石膜

以CH4为放电气体,利用电感耦合等离子体化学气相沉积(ICP-PECVD)法制备了类金刚石薄膜,使用.FTIR、AFM、台阶仪对薄膜进行r表征,并对薄膜的沉积过程进行了光谱诊断(OES).研究了射频功率和基底在放电腔体中的佗置对薄膜表面粗糙度、沉积速率和硬度的影响.实验结果表明:A位置处薄膜粗糙度随着功率的增加先减小后增大,随着射频功率的升高,薄膜的硬度逐渐增大,沉积速率先增大后减小,而薄膜硬度和沉积速率都随着与线圈中心距离的增加而减小.光谱诊断结果显示,随着功率的升高,Iβ/Iα和CH的强度呈增大趋势.结合上述研究结果,分析了影响薄膜生长的多种因素.     

直流脉冲磁控溅射制备ITO薄膜及其光电性能

利用直流脉冲磁控溅射法在室温下制备ITO薄膜.通过台阶仪、紫外-可见分光光度计、四探针仪等表征技术,研究了沉积气压、溅射功率,以及Ar/O2流量比等对ITO薄膜沉积速率、光学性能,以及电学性能的影响.研究结果表明,薄膜沉积速率随沉积气压的增大而减小,随功率的增大而增大;方块电阻随气压的增大而增大,随功率的增大而减小;可见光平均透过率主要受O2流量的影响.在沉积气压为0.5 Pa,Ar/O2流量比为20∶0,溅射功率为250 W,膜厚为200 nm时,薄膜的方块电阻为27Ω/□,可见光平均透过率为84.1%.     

直流脉冲磁控溅射制备ITO薄膜及其光电性能

利用直流脉冲磁控溅射法在室温下制备ITO薄膜.通过台阶仪、紫外-可见分光光度计、四探针仪等表征技术,研究了沉积气压、溅射功率,以及Ar/O2流量比等对ITO薄膜沉积速率、光学性能,以及电学性能的影响.研究结果表明,薄膜沉积速率随沉积气压的增大而减小,随功率的增大而增大;方块电阻随气压的增大而增大,随功率的增大而减小;可见光平均透过率主要受O2流量的影响.在沉积气压为0.5Pa,Ar/O2 流量比为20:0,溅射功率为250W,膜厚为200nm时,薄膜的方块电阻为27Ω/□,可见光平均透过率为84.1%.     

EA4T车轴钢的超声冲击表面强化

利用超声冲击设备对EA4T车轴钢进行了表面强化处理.采利用金相显微镜和透射电镜表征了车轴钢表面结构的变化,并对超声冲击处理前后试样表面粗糙度和显微硬度进行了分析.结果表明:经超声冲击处理后,试样表面发生了剧烈的塑性变形,晶粒明显细化,显微硬度呈梯度化.随着超声冲击功率的增加,变形层厚度增加,粗糙度减小,表面硬度增大;与未经超声冲击处理的试样相比,在超声冲击功率180瓦作用下,表面粗糙度降低了6.5倍,试样的表面硬度提高了25%,变形层厚度大约为80μm.     

Si基扩镓溅射Ga2O3反应自组装GaN薄膜

采用射频磁控溅射工艺在预沉积和预沉积后再分布的扩镓Si基上溅射Ga2O3薄膜氮化反应组装GaN薄膜。用红外透射谱（mR）、X射线衍射（XRD）、扫描电镜（SEM）、选区电子衍射（SAED）和荧光光谱（PL）对样品进行组成、结构、形貌和发光特性的分析。测试结果表明：采用此方法得到六方纤锌矿结构的GaN薄膜。同时显示预沉积的扩镓硅基较预沉积后再分布的扩镓硅基更适合GaN薄膜的生长。     

不同粗糙度岩体节理面的应力松弛特性及机理

应力松弛是岩体节理面时效特性的重要组成部分，也是影响岩体工程长期稳定性的重要因素. 为研究不同粗糙度岩体节理面的应力松弛特性，并进一步探索节理面的应力松弛机理，选取Barton标准剖面为人工模拟节理面的表面形态，并用水泥砂浆浇筑成型；然后，对其进行了分级加载剪切应力松弛试验，研究了不同粗糙度节理面在不同初始应力水平下的应力松弛曲线及应力松弛速率曲线特征，给出了松弛应力与初始应力之间的关系，并结合试验现象分析了应力松弛的发生机理. 研究成果表明:随着初始松弛应力的升高，松弛应力先减小后增大，即岩体节理面应力松弛能力先减弱后增大，该现象与剪切过程中节理面的变形和裂隙发展有关，应力松弛是试验机为保持变形不变而不断调整，同时内部裂隙发育导致其内部抗力减小，进而引起应力下降的过程，并且粗糙度（JRC）越大，应力松弛能力越强.      

脉冲激光沉积 ZnO 薄膜的微结构及发光性能

用波长为1064nm的Nd—YAG激光器，在氧的活性气氛中，通过激光烧蚀Zn靶在Si（111）衬底上获得ZnO薄膜．用电子显微镜（XRD和FESEM）表征ZnO薄膜的结构和表面形貌，用光致发光谱表征光学性质．实验中观察到紫外光发射和深能级的黄绿光发射．紫外光发射是ZnO薄膜的固有性质，深能级光发射是由于存在氧反位缺陷（OZn）．紫外光发射和深能级光发射的强度依赖于薄膜的表面粗糙度．表面粗糙度在nm级范围内的ZnO薄膜可以获得高强度的紫外光．     

光脉冲在LOA-XGM中传输的特性

为了验证线性光放大器的性能，建立了光脉冲在LOA中传输的理论模型，分析了放大器处于增益饱和状态下交叉增益调制效应对传输脉冲的影响、脉冲在LOA中传输的特性，以及不同脉宽对于增益、载流子密度和寿命的影响．结果表明：在相同的信号脉冲峰值增益下，增大抽运光功率或减小探测光功率均使输出脉冲峰值减小；当抽运光功率小于（大于）0．5mW时，输出脉冲上升时间随探测光功率的增加而增加（减小）；随着输入脉冲波长增加，输出脉冲上升时间变长，峰值功率变小；输入脉冲越宽，对载流子密度及其寿命和增益的影响越小．     

基于太阳能的海上电力补给装置的设计

针对目前水下探测设备在续航中出现的问题,本文设计了一种基于太阳能的海上电力补给装置,对其理论性能进行分析计算,制作出样机产品并进行了实际性能测试;计算结果表明,输出功率随着输入功率的升高而增大,但其增大的速度逐渐降低,能量传输效率随着输入功率的增加呈先增大后减小的趋势,在本装置设计条件下,理论计算的最大输出功率为80~90 W,能量传输最大效率为0.8~0.9;性能实验测试结果表明,装置正常运行,能点亮LED灯.     

感应加热工艺参数对Q345钢弯曲角度和曲率半径的影响

基于ANSYS有限元分析软件,采用APDL语言实现高频感应加热成形中电-磁-热-力等多物理场耦合,建立了高频感应加热弯板的三维移动式有限元模型,并系统研究了高频感应加热弯板成形目标与工艺参数的关系。结果表明:加热功率较大时,钢板弯曲角度随着热源移动速度增加先增大再减小,而加热功率较小时钢板弯曲角度随着热源移动速度增加直线下降;钢板弯曲曲率半径随热源移动速度增加而增大,随加热功率增大而减小。最后分别建立了弯曲角度、曲率半径与加热功率和热源移动速度的函数关系式。     

三乙醇胺含量对化学浴法制备硫化铜薄膜的影响

为了研究三乙醇胺(TEA)在化学水域沉积法工艺中的作用,本文以氯化铜, 硫脲, 氨水和三乙醇胺为原料, 采用化学浴沉积法在玻璃基底表面成功制备了硫化铜薄膜. 研究了三乙醇胺不同含量对薄膜的厚度、结构,、形貌和光学性能的影响, 并分析了反应机理. 研究结果表明:三乙醇胺在反应中起到络合剂的作用,随着三乙醇胺含量的增加, 反应诱导时间延长到23 min; 沉积时间相同的情况下,组成薄膜的颗粒粒径变大且薄膜增厚240 nm, 同时透射率呈现出减小的趋势.      

Friction and cutting properties of hot-filament chemical vapor deposition micro- and fine-grained diamond coated silicon nitride inserts

The micro-crystalline diamond (MCD) and fine-grained diamond (FGD) films are deposited on commercial silicon nitride inserts by the hot-filament chemical vapor deposition (HFCVD) method. The friction and cutting properties of as-deposited MCD and FGD films coated silicon nitride (Si₃N₄) inserts are comparatively investigated in this study. The scanning electron microscopy (SEM) and Raman spectroscopy are adopted to study the characterization of the deposited diamond films. The friction tests are conducted on a ball-on-plate type reciprocating friction tester in ambient air using Co-cemented tungsten carbide (WC-Co), Si₃N₄ and ball-bearing steel (BBS) balls as the mating materials of the diamond films. For sliding against WC-Co, Si₃N₄ and BBS, the FGD film presents lower friction coefficients than the MCD film. However, after sliding against Si₃N₄, the FGD film is subject to more severe wear than the MCD film. The cutting performance of as-deposited MCD and FGD coated Si₃N₄ inserts is examined in dry turning glass fiber reinforced plastics (GFRP) composite materials, comparing with the uncoated Si₃N₄ insert. The results indicate that the lifetime of Si₃N₄ inserts can be prolonged by depositing the MCD or FGD film on them and the FGD coated insert shows longer cutting lifetime than the MCD coated one.     

Simulation of temperature distribution in hot filament chemical vapor deposition diamond films growth on SiC seals

In this study, the temperature and gas velocity distributions in hot filament chemical vapor deposition(HFCVD) diamond film growth on the end surfaces of seals are simulated by the finite volume method. The influence of filament diameter, filament separation and rotational speed of the substrates is considered. Firstly,the simulation model is established by simplifying operating conditions to simulate the temperature and gas velocity distributions. Thereafter, the deposition parameters are optimized as 0.6 mm filament diameter, 18 mm filament separation and 5 r/min rotational speed to get the uniform temperature distribution. Under the influence of the rotational speed, the difference between temperature gradients along the directions perpendicular to the filament and parallel to the filament becomes narrow, it is consistent with the actual condition, and the maximum temperature difference on the substrates decreases to 7.4?C. Furthermore, the effect of the rotational speed on the gas velocity distribution is studied. Finally, diamond films are deposited on the end surfaces of Si C seals with the optimized deposition parameters. The characterizations by scanning electron microscopy(SEM) and Raman spectroscopy exhibit a layer of homogeneous diamond films with fine-faceted crystals and uniform thickness. The results validate the simulation model.     

退火温度对化学水浴沉积CdS薄膜性能的影响

采用化学水浴沉积法(CBD)制备了CdS薄膜,用扫描电镜(SEM)、能谱(EDS)、X射线衍射仪(XRD)、分光光度计进行检测.研究了退火温度对CdS薄膜表面形貌、成分、晶体结构和光学性能的影响.研究表明,CdS薄膜为微晶或是非晶态,S/Cd原子比在0.8左右,可见光透过率较高;随着退火温度的升高,薄膜结晶明显,但是透光率下降,禁带宽度范围在2.42～2.59eV之间.     

Friction and wear performances of hot filament chemical vapor deposition multilayer diamond films coated on silicon carbide under water lubrication

Tribological properties of chemical vapor deposition (CVD) diamond films greatly affect its application in the mechanical field. In this paper, a novel multilayer structure is proposed, with which multilayer diamond films are deposited on silicon carbide by hot filament CVD (HFCVD) method. The different micrometric diamond grains are produced by adjusting deposition parameters. The as-deposited multilayer diamond films are characterized by scanning electron microscope (SEM) and white-light interferometry. The friction tests performed on a reciprocating ball-on-plate tribometer suggest that silicon carbide presents the friction coefficient of 0.400 for dry sliding against silicon nitride (Si₃N₄) ceramic counterface. With the water lubrication, the corresponding friction coefficients of silicon carbide and as-deposited multilayer diamond films further reduce to 0.193 and 0.051, respectively. The worn surfaces indicate that multilayer diamond films exhibit considerably high wear resistance.     

A Solution Processable Flexible Transparent Conductive Graphene/PEDOT: PSS Film Fabricated by Spin and Blade Coating

Flexible transparent conductive films were made on PET substrates by spin and blade coating, using graphene sheets dispersed in PEDOT: PSS solution. Ultrasonic substrate vibration was used to improve microstructure and properties of the films. Comparing to the pristine PEDOT: PSS film, the sheet resistance is 3 to 4 orders of magnitude lower with the addition of graphene. The conductivity and reproducibility of the film are improved for two-layer films comparing to one-layer films, with a reduction in transparency. Films prepared with substrate vibration showed lower sheet resistance for one-layer films, as the size of dewetting areas is reduced. In addition, large-area flexible films with desirable conductivity and transmittance were successfully fabricated by blade coating, which is promising, as the process is low-cost, scalable and compatible with roll-to-roll manufacturing.     

有机衬底上射频磁控溅射制备ITO薄膜的研究

Introduction Indium tin oxide (ITO) film has been widely used as a transparent conductor due to its high transparency to visible light and its low electrical resistivity. ITO film can be prepared by many techniques, including thermal evaporation deposition, magnetron sputtering, electron beam evaporation, spray pyrolysis,chemical vapour deposition,dip-coating techniques,and later developed pulsed laser deposition method.     

The Adhesion Improvement of Cubic Boron Nitride Film on High Speed Steel Substrate Implanted by Boron Element

Cubic boron nitride（c-BN） films were deposited on W6Mo5Cr4V2 high speed steel（HSS） substrate implanted with boron ion by RF-magnetron sputtering. The films were analyzed by the bending beam method, scratch test, XPS and AFM. The experimental results show that the implantation of boron atom can reduce the internal stress and improve the adhesion strength of the films. The critical load of scratch test rises to 27.45 N, compared to 1.75 N of c-BN film on the unimplanted HSS. The AFM shows that the surface of the c-BN film on the implanted HSS is low in roughness and small in grain size. Then the composition of the boron implanted layer was analyzed by the XPS. And the influence of the boron implanted layer on the internal stress and adhesion strength of c-BN films were investigated.